Characterization of Ni-implanted GaN and SiC
نویسندگان
چکیده
High concentrations ( /10 cm ) of Ni were introduced into GaN and SiC by ion implantation at 350 8C. On subsequent annealing at 700 8C, there was more residual lattice damage in GaN compared to SiC. Both materials showed ferromagnetism with transition temperatures below 50 K. No secondary phases could be detected by transmission electron microscopy (TEM) or selected area diffraction in either GaN or SiC. The direct implantation process appears useful for studying ion/substrate combinations for potential spintronic applications. # 2002 Elsevier Science B.V. All rights reserved.
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